| 著作名稱： | Kun-Dar Li, 2003, A Study on the Mechanism of Porosity Formation in Aluminum Alloy Castings, Ph.D. Dissertation, National Cheng Kung University. |
| 年度： | 2003 |
| 類別： |
學術專書
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| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, 1998, Analyses on the Mechanism of Porosity Formation in Aluminum Alloys, Masters Dissertation, National Cheng Kung University. |
| 年度： | 1998 |
| 類別： |
學術專書
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, 1996, Calculation the equilibrium concentration of various reaction gases in CVD process based on thermodynamics, Bachelors thesis, National Cheng Kung University. |
| 年度： | 1996 |
| 類別： |
學術專書
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | V.N. Kuzovkov*, E.A. Kotomin, G. Zvejnieks, K.D. Li*, T.H. Ding, L.M. Wang, Void superlattice formation in electron irradiated insulating materials, Advances in Materials Science Research, Volume 2, Chapter 11, pp. 191-216, (2011) Nova Science Publishers, Inc., ISBN 978-1-61728-162-4. |
| 年度： | 2011 |
| 類別： |
學術專書
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Theoretical study for characteristic surface morphologies fabricated by anisotropic chemical etching |
| 年度： | 2018 |
| 類別： |
期刊論文
Journal of Nanoscience and Nanotechnology
|
| 摘要： | The technique of the anisotropic wet chemical etching had turned into one of the widely used processes for manufacturing the functional materials in microelectromechanical systems. To better understand the issues of growth mechanisms for the characteristic surface morphologies during an anisotropic chemical etching, in this study the formation and evolution of surface structures were investigated by numerical simulation methods. A chemical etching model was established on the basis of chemical reaction and atomic diffusion. Affecting by the anisotropy of the crystalline structure and etching rate, various featured surface morphologies, including the rippling surface, cusp-like hillock, and nano-pyramid, were numerically developed in accordance with the etching conditions. These characteristic structures were also in well agreements with the corresponding experiments. From the theoretical point of view, the surface morphologies were critically influenced by the kinetic factors of the anisotropic etching rate and the atomic diffusion. With the enhancement of theoretical work in the formation mechanism for the anisotropic chemical etching, the practical technique would possess a more competitive advantage for the wide applications in the fields of the functional materials fabrication. |
| 關鍵字： | Featured Surface Morphology, Anisotropic Chemical Etching, Nano-Pyramid |
| 著作名稱： | Dynamics of faceted thin films formation during vapor deposition |
| 年度： | 2018 |
| 類別： |
期刊論文
Materials Research Express
|
| 摘要： | In this study, an anisotropic phase-field model was established to simulate the growth of crystalline thin films during vapor deposition. The formation and evolution of characteristic surface with faceted morphologies were demonstrated, in accordance with the regularly obtained microstructure in the actual experiments. In addition, the influences of deposition parameters, such as the deposition rate and the interfacial energy, on the formation mechanism of the characteristic morphology were also illustrated. While a relatively low surface energy of substrate was regarded, the faceted islands were formed, owing to the anisotropic interfacial energy of thin films. In the condition of a high surface energy of substrate, the layered structures of deposited films were produced, which was corresponding to the Frank-van der Merwe growth mode. As various deposition rates were utilized in the numerical simulations, diverse surface morphologies were developed on the basis of the dominant mechanisms, correlating with the adatom diffusion and the deposition kinetics. According to the calculation results, it was observed that a surface character with flattened morphology was generally driven by the adatom diffusion, while the factor of the deposition kinetics was inclined to roughen the surface of thin films. These numerical simulations enhanced the knowledge of thin film growth and facilitated the progress of the vapor deposition technology for advanced applications. |
| 關鍵字： | faceted morphologies, thin film deposition, numerical modeling, anisotropic interfacial energy |
| 著作名稱： | Modeling the characteristic etch morphologies along specific crystallographic orientations by anisotropic chemical etching |
| 年度： | 2018 |
| 類別： |
期刊論文
AIP ADVANCES
|
| 摘要： | To improve the advanced manufacturing technology for functional materials, a sophisticated control of chemical etching process is highly demanded, especially in the fields of environment and energy related applications. In this study, a phase-field-based model is utilized to investigate the etch morphologies influenced by the crystallographic characters during anisotropic chemical etching. Three types of etching modes are inspected theoretically, including the isotropic, 100> and 111> preferred oriented etchings. Owing to the specific etching behavior along the crystallographic directions, different characteristic surface structures are presented in the simulations, such as the pimple-like, pyramidal hillock and ridge-like morphologies. In addition, the processing parameters affecting the surface morphological formation and evolution are also examined systematically. According to the numerical results, the growth mechanism of surface morphology in a chemical etching is revealed distinctly. While the etching dynamics plays a dominant role on the surface formation, the characteristic surface morphologies corresponding to the preferred etching direction become more apparent. As the atomic diffusion turned into a determinative factor, a smoothened surface would appear, even under the anisotropic etching conditions. These simulation results provide fundamental information to enhance the development and application of anisotropic chemical etching techniques. |
| 關鍵字： | preferred orientated etching, anisotropic chemical etching, modeling, surface morphology |
| 著作名稱： | Modeling the influence of incident angle and deposition rate on the nanostructure grown by oblique angle deposition |
| 年度： | 2017 |
| 類別： |
期刊論文
Journal of Physics D: Applied Physics
|
| 摘要： | In this study, numerical approaches were applied to theoretically investigate the influence of process parameters, such as the incident angle and the deposition rate, on the nanostructural formation of thin films by oblique angle deposition (OAD). A continuum model was first developed, and the atomic diffusion, shadowing effect and steering effect were incorporated in the formation mechanisms of the surface morphology and nanostructure of the deposited films. A characteristic morphology of columnar nanorods corresponding to an OAD was well reproduced through this kinetic model. With the increase of the incident angle, the shadowing effect played a significant role in the columnar structures and the ratio of the surface area to volume was raised, implying a high level of voids in the nanostructures. When the deposition rate decreased, the porosity was notably suppressed due to the atomic diffusion in the growth process. These simulation results coincide well with many experimental observations. With the manipulation of the numerical simulations, the underlying mechanisms of the morphological formation during OAD were revealed, which also provided plentiful information to stimulate the process designs for manufacturing advanced materials. |
| 關鍵字： | oblique angle deposition, shadowing effect, slanted nanocolumns, characteristic morphology, continuum model |
| 著作名稱： | Theoretical modeling of the morphological evolution of thin films during deposition processes |
| 年度： | 2017 |
| 類別： |
期刊論文
Journal of Nanoscience and Nanotechnology
|
| 摘要： | In the modern nanotechnology, thin films deposition is one of the fundamental and general techniques to manufacture the nano-materials or nano-devices. The objective of this study is to develop a self-consistent phase-field model to simulate the formation and evolution of thin films during a deposition process. In this study, the microstructural evolution of thin-films was represented by the temporal field variables related to the concentration of the adatoms, which could also reflect the effects of the thermodynamics and kinetics. Various critical factors, such as the interfacial energies between different phases, and the deposition rates of adatoms on the film and substrate, were included in the theoretical model and their influences were further investigated via the numerical simulations. We delivered a comprehensive analysis of the surface morphologies and structures formed in the deposition processing, and indicated the underlying mechanism led to the formation of featured profiles. From the simulation results, it proved that the nucleation and growth of thin films were sensitive to the competitive processes between the deposition and diffusion. The formation of three-dimensional islands or layers on the substrate surface was in accordance with the Volmer-Weber, Frank-van der Merwe and Stranski-Krastanov modes of films growth under the corresponding conditions. This self-consistent model had revealed the general physics related to the growth mechanisms of thin films. In addition, it could also be implemented to predict the characters of thin films in various extreme situations. |
| 關鍵字： | Thin Film Deposition, Growth Mechanism, Surface Morphology, Numerical Simulation |
| 著作名稱： | A kinetic model for the characteristic surface morphologies of thin films by directional vapor deposition |
| 年度： | 2017 |
| 類別： |
期刊論文
Journal of Applied Physics
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| 摘要： | In order to simulate a process of directional vapor deposition, in this study, a numerical approach was applied to model the growth and evolution of surface morphologies for the crystallographic structures of thin films. The critical factors affecting the surface morphologies in a deposition process, such as the crystallographic symmetry, anisotropic interfacial energy, shadowing effect, and deposition rate, were all enclosed in the theoretical model. By altering the parameters of crystallographic symmetry in the structures, the faceted nano-columns with rectangular and hexagonal shapes were established in the simulation results. Furthermore, for revealing the influences of the anisotropic strength and the deposition rate theoretically on the crystallographic structure formations, various parameters adjusted in the numerical calculations were also investigated. Not only the morphologies but also the surface roughnesses for different processing conditions were distinctly demonstrated with the quantitative analysis of the simulations. |
| 關鍵字： | directional deposition, shadowing effect, anisotropic diffusion, faceted nano-columns |
| 著作名稱： | Kinetics modeling of precipitation with characteristic shape during post-implantation annealing |
| 年度： | 2015 |
| 類別： |
期刊論文
AIP Advances
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| 摘要： | In this study, we investigated the precipitation with characteristic shape in the microstructure during post-implantation annealing via a theoretical modeling approach. The processes of precipitates formation and evolution during phase separation were based on a nucleation and growth mechanism of atomic diffusion. Different stages of the precipitation, including the nucleation, growth and coalescence, were distinctly revealed in the numerical simulations. In addition, the influences of ion dose, temperature and crystallographic symmetry on the processes of faceted precipitation were also demonstrated. To comprehend the kinetic mechanism, the simulation results were further analyzed quantitatively by the Kolmogorov-Johnson-Mehl-Avrami (KJMA) equation. The Avrami exponents obtained from the regression curves varied from 1.47 to 0.52 for different conditions. With the increase of ion dose and temperature, the nucleation and growth of precipitations were expedited in accordance with the shortened incubation time and the raised coefficient of growth rate. A miscellaneous shape of precipitates in various crystallographic symmetry systems could be simulated through this anisotropic model. From the analyses of the kinetics, more fundamental information about the nucleation and growth mechanism of faceted precipitation during post-implantation annealing was acquired for future application. |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li*, Three-Dimensional Topography Evolution Algorithm for Ion Beam Etching Process |
| 年度： | 2014 |
| 類別： |
期刊論文
International Journal for Multiscale Computational Engineering
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| 摘要： | Ion etching is one of most common and essential process in modern semiconductor industry. In order to get a better understanding of etching mechanism and provide optimization guidance for manufacturing process, a three-dimensional topography evolution model based on the phase field method is presented to investigate the effects on surface profile formation during ion beam etching process. Integrating with the Monte-Carlo TRIM calculations for different conditions of ion irradiation, the influences of sputtering, redeposition, etching rate and diffusion processes are all taken into consideration to compose a kinetic model for ion etching process. Various surface morphologies with ripple-like, pillar-like and pit-like profiles are formed under different numerical parameters, which are corresponded to various processing conditions. While the sputtering effect plays a dominant factor in the formation mechanism, a roughening topography would be developed, such as the conditions of high ion flux or high ion energy. By decreasing ion flux or increasing temperature, the diffusion process becomes a controlling factor, and it causes a smoothening surface profile. Quantitative analyses of surface roughness for numerical calculations are also examined for the comparison with the experimental observations in the literatures. This theoretical model provides a simple and efficient numerical approach to comprehend the mechanism of topography evolution during ion etching. |
| 關鍵字： | phase field model, ion etching, topography evolution, surface morphology |
| 著作名稱： | Kun-Dar Li*, Modeling the effects of ion dose and crystallographic symmetry on the morphological evolution of embedded precipitates under thermal annealing |
| 年度： | 2014 |
| 類別： |
期刊論文
Nuclear Instruments and Methods in Physics Research B
|
| 摘要： | Thermal annealing is one of the most common techniques to synthesize embedded precipitates by ion implantation process. In this study, an anisotropic phase field model is presented to investigate the effects of ion dose and crystallographic symmetry on the morphological formation and evolution of embedded precipitates during post-implantation thermal annealing process. This theoretical model provides an efficient numerical approach to understand the phenomenon of faceted precipitates formation by ion implantation. As a theoretical analysis, the interfacial energy and diffusion kinetics play prominent roles in the mechanism of atomic diffusion for the precipitates formation. With a low ion dose, faceted precipitates are developed by virtue of the anisotropic interfacial energy. As an increase of ion dose, connected precipitates with crystallographic characters on the edge are appeared. For a high ion dose, labyrinth-like nanostructures of precipitates are produced and the characteristic morphology of crystallographic symmetry becomes faint. These simulation results for the morphological evolutions of embedded precipitates by ion implantation are corresponded with many experimental observations in the literatures. The quantitative analyses of the simulations are also well described the consequence of precipitates formation under different conditions. |
| 關鍵字： | anisotropic phase field, ion implantation, faceted precipitates, thermal annealing |
| 著作名稱： | Kun-Dar Li*, Three-Dimensional Modeling of Embedded Nanoparticles Formation by Ion Beam Implantation, Journal of Computational and Theoretical Nanoscience, 10(3),(2013) (SCI) |
| 年度： | 2013 |
| 類別： |
期刊論文
Journal of Computational and Theoretical Nanoscience
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| 摘要： | A three-dimensional model was developed to investigate the formation of embedded nanoparticles by ion beam implantation. The dynamical nucleation and growth process, including well-known Ostwald ripening, were successfully reconstructed by a theoretical model. Considering various Gaussian distribution profiles of implanted ions for different conditions, the effects of implanted ion mass, fluence, ion flux and temperature on the morphology of nanostructures were also revealed. According to the numerical calculations, no precipitates or particles formed in the early stage of implantation due to the low ion fluence and insufficient time for ion diffusion. With increasing ion fluence, immiscible impurity atoms started to segregate as dispersed nanoparticles. For a very high ion fluence, the implantation-induced nanostructure with a buried layer of implanted atoms developed. These simulation results were fully consistent with many experimental observations. This theoretical model gives a remarkable insight into the formation mechanism, and makes it possible to totally control and optimize the nanostructure through ion-implantation technology. |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li*, Modeling of Feature Profile Evolution for Ion Etching, Journal of Applied Physics, 113, 014305 (2013) (SCI) |
| 年度： | 2013 |
| 類別： |
期刊論文
Journal of Applied Physics
|
| 摘要： | A kinetic model is presented to investigate the profile evolution during ion etching. The effects of ion sputtering, redeposition, and diffusion processes are all taken into consideration in the formation mechanism of surface profile. The dominant factors accounting for the surface smoothening and roughening during ion etching are well explained in this study. Under high ion flux or ion energy, the sputtering effect plays a controlling role in roughening the surface profile with a high etching rate. While decreasing ion flux or ion energy, the surface profile is smoothened by the diffusion mechanism with a long time ion irradiation. For a low temperature, the characteristic length of nanostructures decreases with a sputtered feature profile due to the low mobility. Our simulation results are consistent well with many experimental observations. This theoretical model provides an efficient numerical approach to fully understand the mechanism for the formation of surface profile allowing for designing of appropriate experiments to form specific nanostructures through ion-beam technology. |
| 關鍵字： | |
| 著作名稱： | Synthesis and Characterization of Mesoporous SiO2-CaO-P2O5
Bioactive Glass by Sol-Gel Process |
| 年度： | 2013 |
| 類別： |
期刊論文
Materials Transactions
|
| 摘要： | Ordered mesoporous SiO2-CaO-P2O5 bioactive glass with a highly specific surface area has been synthesized through a sol-gel process in the presence of a nonionic triblock copolymer acting as a template. The amorphous silicate can be detected on the mesoporous SiO2-CaO-P2O5 bioactive glass. The mesoporous SiO2-CaO-P2O5 bioactive glass exhibits the type IV isotherm curve with average pore size of 5.3nm and high specific surface area of 317.24m2/g for calcination at 600°C. Owing to the high specific surface area and pore volume, the mesoporous SiO2-CaO-P2O5 had a significantly enhanced bone-forming bioactivity compared with the conventional bioactive glass. After soaking the mesoporous SiO2-CaO-P2O5 in simulated body fluid (SBF) for 10 h, it can be observed that the formation of apatite nanocrystals occurs on the surface of the bioactive glass. It is anticipated that mesoporous SiO2-CaO-P2O5 with a controlled mesostructure may be potentially useful as novel tissue engineering scaffolds in bone regeneration. |
| 關鍵字： | |
| 著作名稱： | Synthesis, Structural and Optical Characterization of Sol–Gel-Derived Y-Doped Mesoporous CeO2 |
| 年度： | 2013 |
| 類別： |
期刊論文
Journal of ELECTRONIC MATERIALS
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| 摘要： | Highly crystalline and thermally stable undoped CeO2 and Y-doped mesoporous CeO2 particles have been synthesized from cerium(III) nitrate hexahydrate [Ce(NO3)3.6H2O] by the sol–gel method. Mesoporous CeO2 doped with 2 mol.% Y2O3 and calcined at 500C possesses specific surface area of 130.39 m2/g and retains a surface area of 91.84 m2/g at 600C. In comparison, undoped calcined materials have smaller specific surface areas of 43.23 m2/g and 20.24 m2/g at 500C and 600C, respectively. Results from x-ray diffraction
(XRD) analysis, Raman spectroscopy, and selected-area electron diffraction (SAED) analysis indicated that the synthesized undoped CeO2 and Y-doped mesoporous CeO2 have the fluorite structure of bulk CeO2. The crystallite size of CeO2 is also considerably reduced by doping. The optical
bandgap was found to be 3.24 eV for the undoped and 3.36 eV for the doped samples with calcination at 600C. These results suggest that there are potential applications of Y-doped mesoporous CeO2 with nanocrystals in the design of photocatalysts and optical devices. |
| 關鍵字： | |
| 著作名稱： | Lay Gaik Teoh, Kun-Dar Li*, Synthesis and characterization of NiO nanoparticles by sol-gel method, Materials Transactions, 53 (12), (2012). (SCI) |
| 年度： | 2012 |
| 類別： |
期刊論文
Materials Transactions
|
| 摘要： | Due to the outstanding electrical, magnetic and catalytic properties, nickel oxide (NiO) has been received considerable attention during the past decades. In this study, NiO nanoparticles were prepared by sol-gel method, which is one of the simplest and lowest-cost techniques. The synthesis was accomplished by using Poly (alkylene oxide) block copolymer as the surfactant, and Ni(NO3)26H2O as the inorganic precursor. The effect of experimental parameters, such as calcination temperatures and H2O concentration on the NiO nanoparticles formation were investigated. TGA, XRD, SEM, TEM and N2 adsorption-desorption isotherms were used to characterize the microstructure and specific surface area of the samples. TGA and FTIR analyses demonstrated that copolymers were expelled at 573K. The formation of NiO nanoparticles and their structural features were greatly dependent on the calcination temperature. The sample calcined at 923K was composed of pure NiO nanoparticles as shown by XRD. As H2O concentration was increased, the reoxidation process of metallic Ni to form NiO would reduce, but it would not affect the structural type of NiO nanoparticles. In general, the addition of water would weaken and inhibit oxidation effects. The temperature of stable metallic Ni was increased up to 823K. The specific surface area evaluated from the N2 adsorption-desorption indicated that the samples consisting of non-porous NiO nanoparticles. Increasing H2O addition resulted in an increase of specific surface area of nanocrystalline NiO powder. |
| 關鍵字： | NiO nanoparticles, sol-gel method, block copolymer, H2O addition |
| 著作名稱： | Kun-Dar Li, Qiangmin Wei, Lumin Wang, Wei Lu, Dynamics of Nanoscale Void/Fiber Assembly Formation in Irradiated Amorphous Materials, International Journal for Multiscale Computational Engineering, vol. 10 (1), p109-116 (2012). (SCI) |
| 年度： | 2012 |
| 類別： |
期刊論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Modeling of nanocluster formation by ion beam implantation, Journal of Applied Physics, 110, 044318(2011). (SCI) |
| 年度： | 2011 |
| 類別： |
期刊論文
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| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Lay Gaik Teoh, Kun-Dar Li*, Yi Hsuan Liu, Synthesis and characterization of Ni/NiO core-shell nanoparticles prepared by surfactant-mediated method, Nanoscience and Nanotechnology Letters,3 (2011) 1263.(SCI) |
| 年度： | 2011 |
| 類別： |
期刊論文
Nanoscience and Nanotechnology Letters
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| 摘要： | In this study, the Ni/NiO core-shell nanoparticles were prepared by surfactant-mediated method. The synthesis was accomplished by using triblock copolymer as the surfactant, and Ni(NO3)2.6H2O as the inorganic precursor. TGA, XRD, SEM, TEM and N2 adsorption-desorption isotherms were used to characterize the microstructure and specific surface area of the samples. The effect of the calcination temperature and the additive of Cu2O on the microstructure of Ni/NiO core-shell nanoparticles are also investigated in this study. TGA and FTIR analyses demonstrated that copolymers were expelled at 300°C. The sample calcined at 350°C was composed of only metallic Ni nanoparticles shown by XRD. As the calcining temperature was increased, metallic Ni coated with NiO formed. The formation of Ni/NiO core-shell nanoparticles was clearly confirmed by XRD and TEM analyses. The specific surface area evaluated from the N2 adsorption-desorption indicated that the samples consisted of non-porous Ni/NiO nanoparticles. Increasing the additive of Cu2O resulted in a decrease in the crystallinity of Ni formation. The present investigations prove the surfactant-mediated method is valuable for the preparation of Ni/NiO core-shell nanoparticles. |
| 關鍵字： | |
| 著作名稱： | Alejandro Perez-Bergquist, Kun-Dar Li, Yanwen Zhang, Lumin Wang, Ion irradiation-induced bimodal surface morphology changes in InSb, Nanotechnology, 21, 325602 (2010).(SCI) |
| 年度： | 2010 |
| 類別： |
期刊論文
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| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Alejandro Perez-Bergquist, Qiangmin Wei, Lumin Wang, Wei Lu, Energy-dependant irradiation-induced nanostructure formation in amorphous germanium, Journal of Computational and Theoretical Nanoscience, 7(3), p522 (2010).(SCI) |
| 年度： | 2010 |
| 類別： |
期刊論文
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| 摘要： | |
| 關鍵字： | |
| 著作名稱： | V.N. Kuzovkov, E.A. Kotomin, P. Merzlyakov, G. Zvejnieks, K.D. Li, T.H. Ding, L.M. Wang, Void superlattice formation in electron irradiated CaF2: Theoretical analysis, Nuclear Instruments and Methods in Physics Research B, 268, p3055 (2010). (SCI) |
| 年度： | 2010 |
| 類別： |
期刊論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Alejandro Perez-Bergquist, Lumin Wang, Computer simulation of radiation-induced nanostructure formation in amorphous materials, Nuclear Instruments and Methods in Physics Research B, 267, p3063 (2009). (SCI) |
| 年度： | 2009 |
| 類別： |
期刊論文
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| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Qiangmin Wei, Michaela Eddy, Kun-Dar Li, Lumin Wang, Influence of surface morphology on sputtering yields, J. Phys. D: Appl. Phys., 42, 165304 (2009). (SCI) |
| 年度： | 2009 |
| 類別： |
期刊論文
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| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Qiangmin Wei, Xiuli Zhou, Bhuwan Joshi, Yanbin Chen, Kun-Dar Li, Qihuo Wei, Kai Sun, and Lumin Wang, Self-Assembly of Ordered Semiconductor Nanoholes by Ion Beam Sputtering, Advanced Materials, 21, p1-4 (2009). (SCI) |
| 年度： | 2009 |
| 類別： |
期刊論文
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| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Haiyan Xaio, Lumin Wang, Computer simulation study of defect formation and migration energy in Calcium fluoride, Nuclear Instruments and Methods in Physics Research B, 266, p2698 (2008). (SCI) |
| 年度： | 2008 |
| 類別： |
期刊論文
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| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Qiangmin Wei, Kun-Dar Li, Jie Lian, Lumin Wang, Angular dependence of sputtering yield of amorphous and polycrystalline materials, J. Phys. D: Appl. Phys., 41, 172002 (2008). (SCI) |
| 年度： | 2008 |
| 類別： |
期刊論文
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| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li and Edward Chang, "Mechanism of nucleation and growth of hydrogen porosity in solidifying A356 aluminum alloy: an analytical solution", Acta Materialia, vol. 52, p219-231 (2004). |
| 年度： | 2004 |
| 類別： |
期刊論文
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| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li and Edward Chang, "An Analysis on Porosity Formation in A356 Aluminum Alloy Castings", Int. J. Cast Metals Res., vol. 15, No. 1, p25-30 (2002). |
| 年度： | 2002 |
| 類別： |
期刊論文
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| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li and Edward Chang, "A Mechanism of Porosity Distribution in A356 Aluminum Alloy Castings", Materials Transactions, vol. 43, No. 7, p1711-1715 (2002). |
| 年度： | 2002 |
| 類別： |
期刊論文
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| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Dynamics of Morphological Formation Affected by Processing Parameters in Chemical Bath Deposition |
| 年度： | 2022 |
| 類別： |
期刊論文
Journal of the Chinese Society of Mechanical Engineers
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| 摘要： | Attracting by the simple processes with wide applications, even for a long time of development the chemical bath deposition method is still one of the most popular techniques utilized in many modern and advanced manufacturing fields. In this study, a numer-ical model is applied to explore the formation mecha-nisms of a chemical bath deposition and rebuilt the structural evolution of precipitation films during this process. Regarding to the feasibility of this model, various experimental parameters affecting the struc-tural morphologies are taken into consideration to theoretically reveal their influences in the chemical bath deposition process. One of the major contributions in this study is on the characterization of the aniso-tropic growth with a three-dimensional anisotropic model in a chemical bath deposition, which is unique to the related studies. The factors, including the depo-sition rate, the preferred growth orientation and diffusion rate are systematically inspected to form mis-cellaneous surface profiles. From the numerical results, it shows that the pyramid-like surface morphology could be transferred into a four-fold symmetry mountain-like surface morphology by the preferred growth orientation. These numerical simulations visu-alize the processes of the nucleation and growth of precipitations during a chemical bath deposition. The theoretical model provides a favorable tool for the technological developments of chemical bath deposition. |
| 關鍵字： | Crystallographic effect, Chemical bath deposition, Modeling, Phase field |
| 著作名稱： | Kun-Dar Li, Dynamics of Nanodots Formation on Irradiated Materials, Proceedings of the Institution of Mechanical Engineers, Part N, Journal of Nanoengineering and Nanosystems, vol. 226, p69-74 (2012).(EI) (NSC100-2221-E-024-004) |
| 年度： | 2012 |
| 類別： |
期刊論文
Proceedings of the Institution of Mechanical Engineers, Part N, Journal of Nanoengineering and Nanosystems
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| 摘要： | In this study, a theoretical model was developed to investigate the mechanism of self-organized nanodots formation fabricated by ion-beam irradiation. The radiation effects were combined into the theoretical model with vacancy diffusion for a reduction of free energy of mixing and interfacial energy. The influences of dose rate, material properties, and temperature on vacancy production and elimination rates during irradiation were all taken into consideration in the numerical calculations. Incorporated with Monte-Carlo TRIM calculation for the distribution profile of vacancy production rate, the dynamic evolutions of self-organized nanodots with a uniform size on an irradiated surface were fully illustrated by this model. Varied with the experimental conditions, the morphologies and length scales of our calculations are in a good agreement with many experimental observations in the literatures. This theoretical model gives an insight into the mechanism of self-organized pattern formation on irradiated materials through ion-beam technology. |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li and Edward Chang, "Explanation of the Porosity Distribution in A206 Aluminum Alloy Castings", AFS Transactions, vol. 111, 03-108 (2003). |
| 年度： | 2003 |
| 類別： |
期刊論文
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| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li and Edward Chang, "A Modified Mechanism of Porosity Formation in A356 Alloy Permanent Mold Castings", AFS Transactions, vol. 110, p331-338 (2002). |
| 年度： | 2002 |
| 類別： |
期刊論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Ming-Cheng Cheng and Edward Chang, "The Pressure Index of Porosity Formation for A356 Alloy Permanent Mold Castings with Variation of Hydrogen Contents in the Melt", AFS Transactions, vol. 109, p301-310 (2001). |
| 年度： | 2001 |
| 類別： |
期刊論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Ming-Cheng Cheng and Edward Chang, "Effect of Pressure on the Feeding Behavior of A356 Alloy in Low-Pressure Casting", AFS Transactions, vol. 109, p311-320 (2001). |
| 年度： | 2001 |
| 類別： |
期刊論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | The Influence of Process Parameters on the Morphological Characteristics by Directional Etching for Materials Nanoarchitectonics |
| 年度： | 2020 |
| 類別： |
期刊論文
Journal of Nanoscience and Nanotechnology
|
| 摘要： | In nanoarchitectonics, the advanced technology of directional etching is highly demanded for the fabrication of modern electronic device with high anisotropy ratio of structures. To facilitate the manufacturing processes, in this study we focus on establishing a phase-field model with a directional source term to simulate the dynamics of morphological formation and profile evolution in a crystalline substrate. Additionally, the influences of the etching rate, the degree of etching directionality, and the oblique angle on the structural characteristics are also taken into consideration to offer a broad perspective on the directional etching technologies. In the numerical analyses, the featured morphologies are elucidated by the dominant factors based on the mechanism of the profile evolution. The etched surface tends to be roughened with the crystallographic characters, while the kinetics of directional etching plays a prevailing role in the morphological formation. As the surface diffusion of substrate becomes a controlling factor, a flattened profile of the etched surface would be formed even in a condition of high directionality or high oblique angle. The featured surface morphologies, including the pyramid, ripple, mounds and etch pits, are reproduced numerically, and these simulation results correspond well with the observations of directional etching experiments. This study provides the fundamental knowledge and detailed information for the advanced application of the directional etching technology. |
| 關鍵字： | Nanoarchitectonics, Directional Etching, Oblique Etching, Morphological Characteristics, Numerical Modeling |
| 著作名稱： | Effect of Etching Parameters on Gate Profile by Anisotropic Chemical Etching |
| 年度： | 2020 |
| 類別： |
期刊論文
Journal of the Chinese Society of Mechanical Engineers
|
| 摘要： | This pioneer study presents the phenomena of anisotropic chemical etching in the range of the linewidth 15nm~100nm. In this study, a phase-field model is established and a resist mask is appointed on the surface to simulate a chemical etching process with a gate geometry. In the numerical simulations, the isotropic and anisotropic etching conditions are both evaluated to explore the fine chemical etching circumstances. In addition, the influences of etching parameters, such as the etching rate and the strength of the anisotropy, on the characteristics of gate profile are also demonstrated. From the simulation results, it shows that a larger loss of linewidth or a higher etch bias is involved with the increase of the etching rate. While an anisotropic etching is considered, a faceted-etching profile would be generated and simultaneously the etch bias could be suppressed during the etching process. As the anisotropy is strengthened, the characteristic profile becomes more distinct with a less loss of the linewidth. These numerical simulations could provide a methodical guidance to concisely control the fine etching profile, and broaden the applications of chemical etching in the advanced robust manufacturing technologies. |
| 關鍵字： | Crystallographic etching, Anisotropic chemical etching, Modeling, Gate profile |
| 著作名稱： | Study of Force-feedback Tactile Sensor Fabricated by AlN Doped ZnO Piezoelectric Film |
| 年度： | 2018 |
| 類別： |
期刊論文
Journal of the Chinese Society of Mechanical Engineers
|
| 摘要： | In this study, we have developed a flexible AlN doped ZnO tactile sensor. This flexible sensor can be applied on the complex surface of the device. The tactile sensor is fabricated by AlN doped ZnO thin film deposited on the flexible polyimide (PI) substrate or copper substrate. The sol-gel method and spin-coating method are utilized to prepare the AlN doped ZnO piezoelectric films. We have also investigated the influences of the speed of spin-coating on the crystallinity and piezoelectric properties of the thin films. The methods of X-ray diffraction and scanning electron microscopy are used to examine the crystallinity and the surface topography of the AlN doped ZnO thin films. In addition, the force-feedback analyses are performed to compare the output voltages between the sensors on the PI substrate and copper substrate. The response of force feedback proves the availability of this flexible tactile sensor and its robust piezoelectric properties. |
| 關鍵字： | Tactile sensor, Sol-gel, Thin film, ZnO, AlN |
| 著作名稱： | Dynamics of Faceted Nanoparticles Formation in a Crystalline Matrix During Ion Implantation Processing |
| 年度： | 2016 |
| 類別： |
期刊論文
Journal of Nanoscience and Nanotechnology
|
| 摘要： | The faceted nanoparticle synthesized by ion implantation, such as Zn, Cu or Ag nanoparticles, is one of the promising materials for the next generation of optical devices. To understand and better control the manufacturing processes of ion implantation, a theoretical model is applied to investigate the formation and evolution of faceted nanoparticles under various experimental conditions of implantation processing. In this study, the mechanisms of the anisotropic interfacial energy and kinetics with different ion distributions are taken into consideration to demonstrate the role of the crystallographic symmetry, ion energy and temperature on the faceted nanoparticles formation in a crystalline matrix. As presented in the numerical results, the morphological shape of the nanoparticles is mainly affected by the crystallographic symmetry, while the distribution of the precipitates is principally determined by the ion energy. For the condition of high-temperature implantation, a high mobility of ions causes the characteristic length of nanostructures to increase and creates a coarsening morphology of nanoparticles. It is attributed to a longer diffusion distance during the nucleation and growth processes. This model can be widely used for the predictions of the nanostructures formation with various ion implantation processes. |
| 關鍵字： | |
| 著作名稱： | Numerical Study on the Dependence of Surface Topography with Sputter Etching Process |
| 年度： | 2016 |
| 類別： |
期刊論文
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
|
| 摘要： | Concentrating on the irradiation effects and diffusion kinetics, a three-dimensional anisotropic phase field model was derived to simulate the topographical formation and evolution in a crystalline matrix during sputtering etching. The development of surface morphology via a self-organization process in the kinetic model was deliberated upon by the physical mechanisms, such as ion sputtering, redeposition and vacancy diffusion. The characteristic surface profiles were critically affected by the anisotropic interfacial energy and mobility, resulting from the crystallographic symmetry in a crystalline matrix. Regarding to the differences of processing conditions, a variety of surface structures was established numerically, including nano-ripples, nano-pyramids, nano-pillars and nano-walls. These distinctive surface morphologies evolved continuingly with the etching time. Furthermore, the influences of sputtering parameters on the erosion rate and surface roughness during ion etching were also demonstrated quantitatively in this study. These simulation results not only matched well with many experimental observations, but also provided a good guidance for creating featured morphologies with sputtering technique. |
| 關鍵字： | Anisotropic Kinetic Model; Sputter Etching; Crystalline Matrix; Characteristic Morphology |
| 著作名稱： | Influence of process parameters on the microstructure and piezoelectric properties of ZnO film on brass substrate by electrochemical deposition |
| 年度： | 2022 |
| 類別： |
期刊論文
International Journal of Science and Engineering
|
| 摘要： | Due to the severe environmental pollution and shortage of energy resources, the
development of green energy has emerged drastically. In this study, the low-cost and lowpollution
electrochemical deposition method was used to prepare non-toxic zinc oxide films on
brass substrates, and piezoelectric devices were fabricated by zinc oxide with the piezoelectric
properties to convert mechanical energy into electrical energy. In the results, the zinc oxide
films prepared on the brass substrate were produced with the structures of nanorods. With the
increases of the deposition voltage and deposition time, the alignment, morphological
symmetry, and crystallinity of the zinc oxide nanorods could be effectively improved. By
tuning the deposition voltage and electrolyte concentration, the surface morphology and the
growth direction of zinc oxide could be well controlled. In addition, the annealing with the
temperature of 400°C and 500°C could reduce the crystal defects and improve the crystallinity
of zinc oxide. Finally, in the tests of piezoelectric devices, it could be observed that when the
crystallinity of the zinc oxide (002) peak is improved, the output capability of the piezoelectric
device could be increased simultaneously. While 2.350 V and 0.025 M Zn(NO3)2 + 0.025 M
HMTA was used as the deposition voltage and the electrolyte in a electrochemical deposition
on brass substrate for 2 hours, a device with the best piezoelectric property could be obtained.
Furthermore, the subsequent annealing could significantly improve the crystallinity of the zinc
oxide film. However, due to the influence of the mechanical properties of the substrate, the
output capability of the piezoelectric device could not be achieved. |
| 關鍵字： | Electrochemical deposition, ZnO, Piezoelectric characteristics |
| 著作名稱： | Study on the surface morphology and reaction mechanism of silicon by alkaline etching method |
| 年度： | 2021 |
| 類別： |
期刊論文
International Journal of Science and Engineering
|
| 摘要： | Wet chemical etching has become an important technique in the manufacture of
semiconductor and MEMS systems. To better understand and well control this
technology, in this study the reaction mechanisms of anisotropic chemical etching with
characteristic surface morphologies are investigated under various etching conditions,
including the differences in the crystal orientation, the concentration of potassium
hydroxide and the temperature. From the results of the anisotropic etching experiments,
a pyramid-like surface morphology of Si(100) etched with potassium hydroxide are
formed, while a V-groove of Si(110) and steps or triangular pits of Si(111) are observed.
The characteristic surface morphologies of Si(111) and Si(100) would be reduced with
the increase of the potassium hydroxide concentration, and an enhanced surface
morphology in Si(110) is obtained. Owing to the high frequency of collisions between
molecules, the surface morphologies of Si would be flattened as the temperature is
increased. Meanwhile, the etch rate of potassium hydroxide becomes faster with
increasing the temperature. It is also found that the isopropanol can alter the featured
surface morphologies of Si(100) and Si(110). |
| 關鍵字： | Surface morphology, Anisotropic etching, Silicon, Potassium hydroxide |
| 著作名稱： | The influence of etching parameters on the morphology and mechanism of the metal-assisted chemical etching of gallium arsenide |
| 年度： | 2021 |
| 類別： |
期刊論文
International Journal of Science and Engineering
|
| 摘要： | In response to the high demand for the market applications, the development of
etching technology has become more diverse. In recent years, various new etching
techniques for the anisotropic etching had been developed, such as the metal-assisted
chemical etching. In this study, the reaction mechanism of metal-assisted chemical
etching is investigated by altering the etching conditions, such as the temperature and
the concentrations of potassium permanganate and sulfuric acid. From the experimental
results, it shows that the gallium arsenide without gold-coated would be ionized by the
potassium permanganate. Under an annealing temperature of 400°C with gold-coated,
the reactions of the metal-assisted chemical etching emerge in the gallium arsenide
substrate. However, at a low temperature condition the deposited gold might play a role
of a resist-mask. Without a thermal annealing treatment, it is found that the reaction of
metal-assisted chemical etching occurs only at the interface between the semiconductor
substrate and the metal particle. Based on these experiment observations under different
etching conditions, the etching mechanisms of the metal-assisted chemical etching are
revealed to help in understanding and controlling this technology. |
| 關鍵字： | surface morphology, metal-assisted chemical etching, gallium arsenide, gold nanoparticles |
| 著作名稱： | The influence of crystalline structure and anisotropic etching rate on surface morphology by wet chemical etching |
| 年度： | 2020 |
| 類別： |
期刊論文
International Journal of Science and Engineering
|
| 摘要： | Nowadays, the chemical etching technique had become one of the most important processes in the advanced semiconductor manufacturing and microelectromechanical systems. In this study, a theoretical model based on the phase-field method is developed to investigate the formation and evolution of surface morphologies during chemical etching processes. In the formation mechanisms of etched surface morphologies, the anisotropic diffusion of atoms and the anisotropic etching kinetics are both taken into consideration. To enhance the applications of this theoretical model, various etching parameters such as the crystalline structure of substrate and the anisotropic etching rate, corresponding to the different etching conditions are also examined in the numerical calculations. Accompanying with the quantitative analyses of the simulations, the influence of the etching parameters on the formation of surface morphologies during the etching process could be distinctly demonstrated. With the systematic investigations, this study is expected to improve the technique of the chemical etching and the development of the new manufacturing parameters for the applications in the realistic fabrication. |
| 關鍵字： | Phase-field method, Wet chemical etching, Surface morphology, Anisotropic etching |
| 著作名稱： | Characterization of the nucleation and growth of nanoparticles by post-implantation annealing |
| 年度： | 2015 |
| 類別： |
期刊論文
International Journal of Science and Engineering
|
| 摘要： | 奈米粒子擁有獨特的化學與物理特性，被廣泛地應用在各領域之中。本研究以相場法(Phase Field
Method)所建立之理論模型與數值模擬方法，可探討經離子佈植後的退火過程，基材中等向性奈米粒
子的形成與演化機制，其中包含奈米粒子隨時間增加其析出相變之成核、成長與奧氏熟化(Ostwald
ripening)的過程。結合Monte Carlo TRIM 離子佈植的模擬計算，分析不同製程條件參數下，如佈植離
子劑量、離子能量和退火製程溫度等，對奈米粒子微觀結構之演化與成核成長動力學特性的影響。本
理論模型提供不同佈植參數和材料特性的模擬結果，預測經佈植後退火奈米粒子之成核成長與演化
特性。可用以發展具特殊形貌與應用價值之奈米結構材料，增加佈植退火製程在奈米技術中的應用
性。 |
| 關鍵字： | 佈植後退火、奈米粒子、相場理論、成核成長動力學 |
| 著作名稱： | Kun-Dar Li and Edward Chang, "A Study on Porosity Distribution of A356 Aluminum Alloy Castings", Journal of Taiwan Foundry Society, vol. 29, No. 1(No. 116), Mar., p72-79 (2003). |
| 年度： | 2003 |
| 類別： |
期刊論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Ming-Cheng Cheng and Edward Chang, "Feeding Behavior of A356 Alloy by Low-Pressure Casting", Chukung, vol. 28, No. 1(No. 112), Mar., p33-39 (2002). |
| 年度： | 2002 |
| 類別： |
期刊論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li*, A theoretical study of embedded nanoparticles formation by ion irradiation, 2012 MRS Spring Meeting, San Francisco, CA, April 9-13, 2012. (NSC100-2221-E-024-004) |
| 年度： | 2012 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Shang-Chuan Kuo, James Yang, Kun-Dar Li*, Modeling of nano-fibers and nano-porous layer formation in an amorphous materials: a cross-section view, 2012 MRS Spring Meeting, San Francisco, CA, April 9-13, 2012. (NSC100-2221-E-024-004) |
| 年度： | 2012 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Weixing Li, Lumin Wang, Rodney C. Ewing, Eugene A. Kotomin, Dynamics of Microstructural Evolution in Electron-Irradiated Fluor-Apatite, REI-15 (Radiation Effects in Insulators), Padova, Italy, Aug. 30- Sept. 4, 2009. |
| 年度： | 2009 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | E.A. Kotomin, V.N. Kuzovkov, G.Zvejnieks, K.-D. Li, L.M. Wang, Void Superlattice Formation In Electron Irradiated CaF2: Theoretical Analysis, REI-15 (Radiation Effects in Insulators), Padova, Italy, Aug. 30- Sept. 4, 2009. |
| 年度： | 2009 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Alejandro Perez-Bergquist, Qiangmin Wei, Lumin Wang, Modeling of effects of ion energy and mass on self-organized nanostructure formation during ion-beam implantation, 2008 MRS Fall Meeting, Boston, MA, December 1 - 5, 2008. |
| 年度： | 2008 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Qiangmin Wei, Lumin Wang, Modeling of self-organized pattern formation on semiconductor surfaces under ion sputtering, 2008 MRS Fall Meeting, Boston, MA, December 1 - 5, 2008. |
| 年度： | 2008 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Lumin Wang, Computer simulation of radiation induced cavity and nanostructure formation in amorphous materials, The 9th International Conference on Computer Simulation of Radiation Effects in Solids, Beijing, China, October 12 – 17, 2008. |
| 年度： | 2008 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Lumin Wang, Q. Wei, A. Perez-Bergquist, X. Xiang, W. X. Li, K. D. Li, Y. W. Zhang, V. Skuratov, Ion Beam Processing of Nanostructures: From KeV to GeV in Ion Energy, TMS 2008 the 137th Annual Meeting & Exhibition, New Orleans, Louisiana, March 9-13, 2008. |
| 年度： | 2008 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Wei Lu, Lumin Wang, Dynamics of irradiation-induced nano-fiber formation in germanium, 2007 MRS Fall Meeting, Boston, MA, November 26 - 30, 2007. |
| 年度： | 2007 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Weixing Li, Kun-Dar Li, Kai Sun, Rod Ewing, Lumin Wang, A model for fission track formation in fluorapatite considering radiation induced decomposition, 2007 MRS Fall Meeting, Boston, MA, November 26 - 30, 2007. |
| 年度： | 2007 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Haiyan Xaio, Lumin Wang, Computer simulation study of the defect and threshold displacement energy in calcium fluoride, the 14th International Conference on Radiation Effects in Insulators, Caen, France, August 28-September 1, 2007. |
| 年度： | 2007 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Lumin Wang, Weixing Li, Kai Sun, Kun-Dar Li, Jie Lian, Rodney Ewing, Study of the nature and annealing behavior of fission tracks in natural apatite, the 14th International Conference on Radiation Effects in Insulators, Caen, France, August 28-September 1, 2007. |
| 年度： | 2007 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li and Edward Chang: Explanation of the Porosity Distribution in A206 Aluminum Alloy Castings, AFS 107th Casting Congress, Milwaukee, WI, April 26-29, 2003. |
| 年度： | 2003 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li and Edward Chang: A Modified Mechanism of Porosity Formation in A356 Alloy Permanent Mold Castings, AFS 106th Casting Congress, Kansas City, MO, May 4-7, 2002. |
| 年度： | 2002 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Ming-Cheng Cheng and Edward Chang: Effect of Pressure on the Feeding Behavior of A356 Alloy in Low-Pressure Casting, AFS 105th Casting Congress, Dallas, Texas, April 28-May 1, 2001. |
| 年度： | 2001 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Computer simulation of nanocluster formation by ion beam implantation, IUMRS-ICA 2011, 12th International Conference in Asia & 2011 MRS-T Annual Meeting, Taipei World Trade Center Nangang Exhibition Hall, Sept. 19-21, 2011. |
| 年度： | 2011 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Lay Gaik Teoh, Kun-Dar Li*, Yi Hsuan Liu, Preparation and properties of Ni/NiO core-shell nanoparticles with a surfactant-mediated method, IUMRS-ICA 2011, 12th International Conference in Asia & 2011 MRS-T Annual Meeting, Taipei World Trade Center Nangang Exhibition Hall, Sept. 19-21, 2011. |
| 年度： | 2011 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Lay Gaik Teoh, Kun-Dar Li*, Yi Hsuan Liu, Effect of Cu2O on the Formation of Ni/NiO Core-Shell Nanoparticles, 2011 The International Conference on Green Technologies, National Pingtung University of Science and Technology, Pingtung, Taiwan, October 12~15, 2011. |
| 年度： | 2011 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li*, Modeling of surface pattern induced by ion sputtering, 2011 The International Conference on Green Technologies, National Pingtung University of Science and Technology, Pingtung, Taiwan, October 12~15, 2011. (NSC100-2221-E-024-004) |
| 年度： | 2011 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | James Yang, Shang-Chuan Kuo, Kun-Dar Li*, Yan-Li Jiang, Numerical Simulation On The Irradiated-Induced Nano-Structure For Different Ion Energy/Mass, 2011 International Symposium On Nano Science And Technology, Southern Taiwan University, Tainan, Taiwan, Nov. 18-19, 2011. (NSC100-2221-E-024-004) |
| 年度： | 2011 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Shang-Chuan Kuo, James Yang, Yan-Li Jiang, Kun-Dar Li*, The Effect Of Temperature On The Radiation-Induced Nanostructure Formation: A Model Study, 2011 International Symposium On Nano Science And Technology, Southern Taiwan University, Tainan, Taiwan, Nov. 18-19, 2011. (NSC100-2221-E-024-004) |
| 年度： | 2011 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li*, Dynamics of nanodot formation in irradiated materials, 2011 International Symposium On Nano Science And Technology, Southern Taiwan University, Tainan, Taiwan, Nov. 18-19, 2011. (NSC100-2221-E-024-004) |
| 年度： | 2011 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Lumin Wang, Bang-Yen Chou, Computer simulation of irradiation-induced nanostructure formation, 2010 MRS-T Annual Meeting, I-Shou University, Kaohsiung County, Nov. 19-20, 2010. |
| 年度： | 2010 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Efrain Hernandez-Rivera, Bang-Yen Chou, Finite Element Method Simulation of Nano-Dots Formation under Ion Beam Modification: Ion Flux and Sputtering Case, 2009 MRS-T Annual Meeting, National Dong Hwa University, Taiwan, Nov. 26 – 28, 2009. |
| 年度： | 2009 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Bang-Yen Chou, Shi-Wei Wang, Modeling of the Effects of Stress-Strain Distribution in Plastic Injection Process, 2008 MRS-T Annual Meeting, National Taipei University of Technology, Taiwan, Nov. 21 - 22, 2008. |
| 年度： | 2008 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li, Bang-Yen Chou, Shi-Wei Wang, Computer simulation and the stress analysis of screw in plastic injection process, 2007 MRS-T Annual Meeting, National Chiao Tung University, Taiwan, Nov. 16 - 17, 2007. |
| 年度： | 2007 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li and Bang-Yen Chou: A Kinetic Mechanism of Porosity Formation in Aluminum Casting, The 2005 Annual Conference of the Chinese Society for Materials Science, Tam-Kang University, Taipei, Nov. 25-26, 2005. |
| 年度： | 2005 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Chung-Yuo Lee, Kun-Dar Li and Edward Chang: Porosity Formation in A356 Alloy Castings, The 2002 Annual Conference of the Chinese Society for Materials Science, National Taiwan University, Taipei, Nov. 22-23, 2002. |
| 年度： | 2002 |
| 類別： |
會議論文
|
| 摘要： | |
| 關鍵字： | |
| 著作名稱： | Kun-Dar Li and Edward Chang: A Study on Porosity Distribution of A356 Aluminum Alloy Castings, The 2002 Annual Conference of Chinese Foundrymens Association, I-Shou University, Kaohsiung County, Nov. 30, 2002. |
| 年度： | 2002 |
| 類別： |
會議論文
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| 著作名稱： | Kun-Dar Li, Ming-Cheng Cheng and Edward Chang: Feeding Behavior of A356 Alloy by Low-Pressure Casting, The 2001 Annual Conference of Chinese Foundrymens Association, National Taiwan Normal University, Taipei, Dec. 8, 2001. |
| 年度： | 2001 |
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會議論文
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| 著作名稱： | Kun-Dar Li, Ming-Cheng Cheng and Edward Chang: Porosity Formation for A356 Alloy Castings with Variation of Hydrogen Contents in the Melt, The 2001 Annual Conference of the Chinese Society for Materials Science, National Chung Hsing University, Taichung, Nov. 23-24, 2001. |
| 年度： | 2001 |
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會議論文
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| 著作名稱： | Kwanyu Chen, Zhoug-Long Chung, Kun-Dar Li, Modeling of nanoparticle formation by thermal annealing process, 2012 International Symposium on Nano Science and Technology, Southern Taiwan University, 8-9 November 2012 |
| 年度： | 2012 |
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會議論文
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| 著作名稱： | Yan-Li Jiang, Kun-Dar Li, Chung-Chi Jen, Wen-Hao Yuan, Bang-Yen Chou, The influence of calcination temperature on phase transformation of In2Se3, 2012 International Symposium on Nano Science and Technology, Southern Taiwan University, 8-9 November 2012 |
| 年度： | 2012 |
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會議論文
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| 著作名稱： | Zhong-Long Chang, Shun-Kai Hsu, Shu-Jui Chang, Kun-Dar Li, Quantitative Analysis On Nanostructures Of Ion Beam Process, 2012 International Symposium on Nano Science and Technology, Southern Taiwan University, 8-9 November 2012 |
| 年度： | 2012 |
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會議論文
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| 著作名稱： | Jin-Chian Yang, Chung-Jen Chung, Kun-Dar Li, Study on surface morphology of germanium by focus ion beam irradiation, 2012 International Symposium on Nano Science and Technology, Southern Taiwan University, 8-9 November 2012
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| 年度： | 2012 |
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會議論文
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| 著作名稱： | 李昆達, 鋁合金鑄造孔洞形成之動力學模式研究, 國科會研究計畫報告, 2005.07 |
| 年度： | 2005 |
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研究計畫成果報告
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| 著作名稱： | 李昆達, 鋁合金DC澆鑄製程水模設備建立, 中國鋼鐵股份有限公司鋼鋁研發處報告, 2004.09 |
| 年度： | 2004 |
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研究計畫成果報告
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| 著作名稱： | 李昆達, 石漢正, 5182鋁胚頭端熱軋開口裂成因之分析及改善, 中國鋼鐵股份有限公司鋼鋁研發處報告, 2004.07 |
| 年度： | 2004 |
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研究計畫成果報告
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| 著作名稱： | 李昆達, 以電腦影像分析技術輔助PoDFA評量鋁湯介在物, 中國鋼鐵股份有限公司鋼鋁研發處報告, 2004.03 |
| 年度： | 2004 |
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研究計畫成果報告
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| 著作名稱： | 游瑞坤, 李昆達, 5083鋁胚均質後表面熔析黑色點狀物改善, 中國鋼鐵股份有限公司鋼鋁研發處報告, 2003.12 |
| 年度： | 2003 |
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研究計畫成果報告
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| 著作名稱： | 李昆達, 鋁熔鑄生產設備製程現場實習, 中國鋼鐵股份有限公司鋼鋁研發處報告, 2003.11 |
| 年度： | 2003 |
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研究計畫成果報告
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| 著作名稱： | 周倉榮, 李昆達等, 鋁熔鑄未來三年短、中程研發工作規劃, 中國鋼鐵股份有限公司鋼鋁研發處報告, 2003.10 |
| 年度： | 2003 |
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研究計畫成果報告
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